Abstract
A new stamp fabrication technique for the soft lithography has been developed in the range of several microns by means of a nano-replication printing (nRP) process. In the nRP process, a figure or a pattern can be replicated directly from a two-tone bitmap figure with nano-scale details. A photopolymerizable resin was polymerized by the two-photon absorption which was induced by a femtosecond laser. After the polymerization of master patterns, a gold metal layer (about 30 nm thickness) was deposited on the fabricated master patterns for the purpose of preventing a join between the patterns and the POMS, then the master patterns were transferred in order to fabricate a stamp by using the POMS (poly-dimethylsiloxane). In the transferring process, a few of gold particles, which were isolated from the master patterns, remained on the POMS stamp. A gold selective etchant, the potassium iodine (KI) was employed to remove the needless gold particles without any damage to the POMS stamp. Through this work, the effectivcness of the nRP process with the POMS molding was evaluated to make the POMS stamp with the resolution of around 200 nm.<br/>
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