Abstract
Compositionally gradient chromium aluminum oxynitride (Cr-Al-N-O) thin films have been prepared through the pulsed laser deposition method. The aluminum content in metallic elements (x) ranging from 30 to 95 at% were successfully changed with position of one thin film sample. The X-ray diffraction revealed the crystal structure of the main phase to be NaCl type. The Cr-Al-N-O thin film with x=35 at% exhibited the highest Vickers hardness HV of 4300.
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