결정질 실리콘 태양전지의 Ag 촉매층을 이용한 나노 텍스쳐링 공정에 관한 연구

Abstract

In our report a relatively simple process for fast nano-texturing of p-type(100) CZ- silicon surface using silver catalyzed wet chemical etching in aqueous hydrofluoric acid (HF) and hydrogen peroxide solution(<TEX>$H_2O_2$</TEX>) at room temperature. The wafers were saw-damaged by NaOH(6 wt%) at <TEX>$60^{\circ}C$</TEX> for 150s. To obtain a nano-structured black surface, a thin layer of silver with thickness of 1 - 10 nm was deposited on the surfaces by evaporation system. After this process the samples were etched in HF : <TEX>$H_2O_2$</TEX> : <TEX>$H_2O$</TEX> = 1:5:10 at room temperature for 80s - 220s. Due to the local catalytic of the Ag clusters, this treatment results in the nano-scale texturing on the surface. This resulted in average reflectance values less than 9% after the silver on the surface of the wafers were removed.