Abstract
Dense and fine polymer patterns often collapse, as they come into contact with each other at their protruding tips. Resist pattern collapse depends on the aspect ratio of patterns and the surface tension of rinsing materials. The pattern collapse is a very serious problem in microfabrication, because it is one of the factors which limit the device dimensions. The reasons for the pattern collapse are known as the surface tension of rinse liquid, centrifugal force and rinse liquid flow produced in the developing process. In this work, we tried to evaluate the pattern collapse of three-dimensional microstructures that were fabricated by two-photon induced photopolymerization, and showed the way how to reduce the deformation of microstructures.
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