Abstract
The paper considers current conceptions of generation of mechanical stresses in epitaxial, polycrystalline and amorphous films during their growth and under different external actions. The mechanism of stress generation in geteroepitaxial films due to misfit in crystal lattices of the film and substrate is described. The relation between arising of the misfit stress in heterostructures and variation of their growth mode is shown. The mechanisms of generation of compressive and tensile stresses in polycrystalline films caused by nucleation and coalescence of islands at the beginning of their growth are considered. Different aspects of evolution of intrinsic stresses in continuous films are discussed in dependence of their deposition conditions, chemical composition, microstructure and mechanical properties. Special attention is given to consideration of generation mechanisms of intrinsic stresses in thin films concerned with formation of pint defects, incorporation of impurities and phase transformations during deposition. Factors leading to arising extrinsic stresses in thin films during their storage and operation are described in details.
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