Abstract
For a reclamation system of ultra pure water, which is used for cleaning wafers in semiconductor manufacturings, we investigated the degradation characteristics of total organic carbon (TOC) in a UV-C oxidation pilot plant accompanied by hydrogen peroxide. By comparing the degradation rates of methanol, acetone and isopropyl alcohol (IPA) in a batch reactor, the TOC degradation rate of methanol was the fastest, and acetone exhibited almost the same rate as IPA.Acetone was selected as a source of TOC, and its intial reaction rate was determined to be 0.7th order in terms of TOC concentration in the range of 0.5-2mg-C·l-1 for TOC and 10-60ppm for hydrogen peroxide. The degradation-rate constant was observed to be the largest when hydrogen-peroxide concentration was 10-14ppm under the conditions studied. The overall degradation rate was simulated to be 0.5th order, including the high conversion of 0.9.The rate constant was proportional to the UV output, and the different effect of internal light filtering was caused by hydrogen peroxide when number of lamps was changed.
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