Abstract
Article history: Pattern layout design is very important to the automation of apparel industry. Until now, the genetic algorithm and Tabu search method have been applied to layout design automation. With the genetic algorithm and Tabu search method, the obtained values are not always consistent depending on the initial conditions, number of iterations, and scheduling. In addition, the selection of various parameters for these methods is not easy. This paper presents a hybrid search method that uses a neural network and simulated annealing to solve these problems. The layout of pattern elements was optimized to verify the potential application of the suggested method to apparel pattern layout design.
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