Ｎｉ／Ｐｄ膜構造の下地条件依存性の分子動力学法による検討

Abstract

Molecular dynamics simulations of the formation process of Ni/Pd bilayer films were performed by employing the embedded atom method with high (10 eV) and low (0.1 eV) kinetic energies of incident atoms for two different crystal orientations: fcc(111) and fcc(100).The tendencies of the film formation process and the interdiffusion at the interface were similar in both the (111) and (100) cases. However, the strain at the interface of films on the (100) substrates was larger than that on the (111) substrates.In the case of Pd deposited on an Ni(100) underlayer, the Pd film grew with the (111) symmetry and partially observed Ni(100)-c(16 × 2) structure. The crystal orientation of the Pd layer varied according to the value of the strain in the Ni(100) underlayer, regardless of the surface condition of that underlayer. In the crystal orientation dependencies, the value of the strain in the magnetic layer at interfaces, which is obtained by simulation, corresponds well to the experimental value of the perpendicular magnetic anisotropy.