Year-end Sale % OFF 
Abstract
We demonstrate triple ion implanted 4H-SiC bipolar junction transistor (BJT). By etching the extrinsic base regions using inductively coupled plasma dry etching, the characteristics of triple ion implanted 4H-SiC BJT were significantly improved. Maximum common emitter current gain was improved from 1.7 to 7.5.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: IEEJ Transactions on Electronics, Information and Systems
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
