Abstract
We prepared magneto-impedance (MI) elements of Cu wires electrolessly-deposited with Fe-Ni-P and Fe-Ni-B film layers, and investigated the dependence of their MI effect on the frequency (f) and the film thickness (t). A maximum MI sensitivity of about 100 %/Oe was obtained for the MI element of an 11.3 wt.% Fe-Ni-P film with t = 5 μm at f = 10 MHz. High MI sensitivity was obtained with an increase in the film thickness of the element, owing to the larger maximum MI ratio (ηmax) and the smaller anisotropy field (Hk).
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