Abstract
The oxidation mechanism of Nicalon coated with CVD⋅SiC layer was studied. Using CH3SiCl3-H2 gas mixture, CVD⋅SiC was deposited on Nicalon fiber heated at 1473K. The rate of oxidation was measured with a thermobalance in O2 stream at temperatures from 1473 to 1773K. The reaction products were examined by X-ray diffraction and SEM observation.The oxidation film was formed at the skin. of CVD⋅SiC layer. Neither oxidation nor pyrolysis proceeded in Nicalon coated with CVD⋅SiC. The oxidation rate of CVD⋅SiC was slower than that of Nicalon. The oxidation rate of CVD⋅SiC followed the parabolic rate law. The activation energy was 186kJ/mol. It is considered that the oxidation rate is controlled by the gaseous diffusion through the micro-pores in the oxide film.
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