Abstract
Co-(0∼15)at%Ta-N sputtered films were investigated in order to clarify the correlation among the structure, induced magnetic anisotropy, local anisotropy fluctuation, and soft magnetic properties. The results for electric resistivity and film magnetostriction indicate that the temperature Tx1 at which Co crystallites were formed from amorhous structure was lower than the temperature at which crystallites of Ta-nitride were formed, and the difference was about 150°C in Co-15at% Ta-N films. On the other hand, uniaxial magnetic anisotropy was drastically induced at Tx1 by annealing in the magnetic field, while, even after crystallization, a uniaxial anisotropy of about 2×103 erg/cc could be reversibly induced by annealing in the magnetic field.
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