Abstract
Fe/Fe-N multilayered films were made by alternation of Fe sputtering at various Ar gas pressures and ECR nitrogen plasma exposure, and the structure and magnetic properties of these films were investigated. Growth of a columnar structure was observed in an Fe film prepared at a high Ar gas pressure. Fe/Fe-N multilayered films with an Fe layer prepared at a low Ar gas pressure have a low Hc and high Bs. X-ray diffraction suggests that the lattice spacing of Fe(110) and the compressive stress in these films increase with a decrease in Ar gas pressure. These structural changes are caused by the nitrogen diffusion from the Fe-N layer into the Fe layer. Nitrogen exists as a solid solution in an Fe layer prepared at a low Ar gas pressure, but as a nitride in an Fe layer prepared at a high Ar gas pressure.
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