Abstract
A new observation method was developed for visualizing microstructure on a chemical-mechanically polished (CMP) surface for tempered martensite of a medium-carbon steel (JIS-SCM440).The CMP and an electropolished (EP) surfaces were observed using an atomic force microscope (AFM) and a field emission type-scanning electron microscope (FE-SEM), respectively. AFM images, FE-secondary and backscattering electron images and electron backscattering patterns (EBSP) were obtained for the CMP and EP surfaces.The AFM and FE-secondary electron images of the EP surface clearly visualized blocks and cementite particles, since the unevenness corresponding to blocks and cementite particles were formed by the electropolishing.On the other hand, the AFM image of the CMP surface revealed that the CMP process produced a very smooth surface with unevenness not exceeding 10 nm. The FE-backscattering electron images of the CMP surface only visualized the crystal-misorientation of the martensite matrix microstructure clearly, since the images are not influenced by the surface unevenness.The CMP surface is more appropriate than the EP surface for the EBSP measurement, since the unevenness of the CMP surface is smoother than that of the EP surface. Blocks with high-angle boundary beyond 15° could be recognized by EBSP mapping, but laths with low-angle boundary bellow 3° could not be done.
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