변화된 산소분압으로 증착된 SnO2박막의 표면과 계면에 관한 연구

Abstract

This report examines the variations on structural properties of <TEX>$SnO_2$</TEX> thin films deposited by using thermal chemical vapor deposition techniques with different oxygen flow gas. TEM showed some of the interface to be atomically rough. The aspects of the boundary shape and growth behavior agree well with the theory of interface growth. The electron diffraction showed that the roughness was changed as the different oxygen flow gas increased. These measurement results suggested that the number of interface facet and abnormal grain growth were related oxygen flow gas.