Abstract
This paper reports on the magnetic properties of Fe-Al-Si/Fe multilayer films prepared by rf sputtering. As-deposited Fe-Al-Si/Fe multilayer films have a high saturation flux density of 16 kG and an initial permeability of more than 1000, even though the initial permeability of single-layer Fe-Al-Si film is less than 500. As-deposited Fe and Fe-Al-Si single-layer films of thickness less than 1000 A have good soft magnetic properties. The soft magnetic properties of the multilayer films are improved by annealing, which acts to relieve the internal stress. The thinner the individual layers of the film, the better are the soft magnetic properties of the film. Fe-Al-Si (50A)/Fe (50A) multilayer films annealed at 400 to 450°C exhibit a low coercivity of 0.7 Oe and a high initial permeability of 4000.
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