Abstract

酒石酸修飾Raneyニッケル/CdS光触媒を用いた不斉合成 アセト酢酸メチルから3‐ヒドロキシ酪酸メチルへの不斉水素化

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call