Abstract
The emission (700-1000 nm) and absorption (200-800 nm) spectra of LiF and LiF:OH crystals irradiated in a reactor and exposed to ultraviolet light, including those combined with mechanical loading, have been studied. The aim of this work is to study the behavior of laser color centers in these systems. In the 710–825 nm range, diametrically opposite results are observed: high stability of F4-like centers in “pure” LiF and their sharp destruction in LiF:OH crystals. At the same time, in both groups, F3 and F4 centers are destroyed and F2+ and F3- laser centers (825–925 nm) are intensely accumulated. Upon subsequent exposure at room temperature and darkness, spontaneous disintegration of laser centers is observed, accompanied by an increase of concentration of F4-like centers and restoration of the microstructure of irradiated crystals.
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