Микроволновая вольт-импедансная спектроскопия полупроводниковой структуры

Abstract

Microwave voltage-impedance spectroscopy is used to study a semiconductor structure in the form of a doped n-GaAs film grown on a conducting n+-GaAs substrate with a buffer sublayer. A system of concentric barrier contacts is formed on the structure surface. A technique has been developed for measuring complex impedance spectrum Z(f,U) of the sample as a function of DC bias voltage U. Spectra Z(f,U) were measured using a Cascade Microtech probe station in the frequency range 0.01 – 40 GHz with a lateral resolution of 15 – 30 μm at U = 0 – 10 V. The main electrophysical characteristics of a semiconductor film were determined from the spectra: type, concentration and mobility of free charge carriers, electrical conductivity. An excess resistance was found in the range f = 0.1 – 20 GHz. This effect is interpreted as the deep states (traps) recharging for two types of traps – low-frequency l and high-frequency h with characteristic time τl = 10^(-9) s, τh = 4.2∙10^(-11) s. A model description is proposed that explains the characteristic shape of the trap resistance spectrum, its dependence on the contact area and voltage U.