Abstract
Adsorption of nitic oxide molecules NO on the surface of structurally ordered 1, 2 and 3 monolayer thick nickel films deposited onto W(110) surface has been studied by means of reflection-absorption infrared spectroscopy. The structure of nickel films at all thicknesses studied corresponds to Ni(111) crystal. The IR spectra of NO molecules adsorbed on a 3 monolayer Ni film correspond to those of NO on bulk Ni(111) crystal. At lower film thickness there are differences more pronounced for a monolayer film. This is due to additional effect of underlying W(110) support upon the intramolecular NO bond, and/or to some distortion of (111) structure of monolayer film, compared to bulk Ni(111), because of potential relief of the substrate and, consequently, change of adsorption geometry and electron state of NO molecules.
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