Abstract
<TEX>$TeO_x$</TEX> thin films were deposited at various <TEX>$O_2$</TEX>/Ar gas-flow ratios by a reactive RFmagneton sputtering technique from <TEX>$TeO_2$</TEX> and Te targets. X-ray diffraction (XRD) results revealed that the <TEX>$TeO_x$</TEX> thin films were amorphous. The structure and chemical composition of the <TEX>$TeO_x$</TEX> thin films were investigated by fourier transform infrared spectroscopy (FT-IR) and X-ray photoelectron spectroscopy (XPS). The optical characteristics of the <TEX>$TeO_x$</TEX> thin films were investigated by an Ellipsometer and a UV-VIS-NIR spectrophotometer. According to the <TEX>$O_2$</TEX>/Ar gas-flow ratios, the atomic composition ratio of <TEX>$TeO_x$</TEX> thin films was divided into two regions(x=1-2, 2-3). Different optical characteristics were shown in each region. With an increasing <TEX>$O_2$</TEX>/Ar gas-flow ratio, the refractive index of the <TEX>$TeO_x$</TEX> thin films decreased and the optical bandgap of the films increased.
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