Abstract
There are two different categolies in Plasma Chemical Process: one using electron energy in Non-Equilibrium plasma to produce radicals and other chemically active species, and other using extremely high temperature thermal energy possible to generate by electrical discharges. The former one “Non-Equilibrium Plasma Chemistry”is widely in use in semiconductor processing in a form of “High-Frequency Low-Pressure Plasma Processing”, as well as “Pulse Corona Plasma Chemical Processing (PPCP) ”and “Surface Discharge Plasma Chemical Process (SPCP) ”. Discussions are made on the basic nature of the non-equilibrium plasma as a whole, and on PPCP and SPCP which enabled use of this process under ordinally pressure range.
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