Abstract
The purpose of the research is to study the influence of copper plating electrolyte composition and cathodic current density on the copper current output as well as on the quality and thickness of the copper coating. The experiment was carried out in standard copper plating electrolytes and in electrolytes with the addition of phenolsulfonic acid of various concentrations with varying values of the cathode current density across a certain range. It has been established that the addition of phenolsulfonic acid across the studied concentration range has a favourable effect on the quality of the coating and contributes to the production of fine-grained, dense, slightly shiny precipitates. As a result of the studies, the optimal copper electrodeposition mode was determined.
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