Abstract
It is difficult to use roll-to-roll (R2R) substrate transfer and pressing process to secure the productivity of the nanoimprint lithography (NIL) process based on the contact pressing mechanism R2R NIL patterning with a precise level of uniform pressure in the imprinting area. In conventional pressing, the precision of the imprint process is limited by bending deformation of the pressing roller, processing errors of roundness and straightness, and roller alignment errors. Thus, a new type of force point adjustable pressing roller (FPAP) module to minimize bending deformation of the pressing roller and an air cushion pressing roller (ACP) module to improve unevenness caused by roller deformation, roller geometrical errors were developed. The performance of the new uniform pressing module was experimentally verified: pressure uniformity at the imprinting contact surface was ±30% for the conventional pressing module compared to ±7% for the FPAP module. The ACP module improved this value to ±3.5%.
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