Abstract
We have fabricated an optoacoustic ultrasound generator based on nanostructured germanium (Ge). Ge thin films were deposited via e-beam evaporation and then etched using a metal-assisted chemical (MAC) method to form nanostructured Ge films. The measured intensity of ultrasound from the nanostructured Ge covered with PDMS was about 3 times stronger than that of 100-nm-thick chromium (Cr). When the nanostructured Ge was embedded in the PDMS, the intensity of ultrasound became 8.5 times as strong compared to the 100-nm-thick Cr.Keywords: Ultrasound, Optoacoustic effect, Germanium, Metal-assisted chemical etching, NanostructureOCIS codes: (110.5125) Photoacoustics; (170.7170) Ultrasound; (220.4241) Nanostructure fabrication
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