Abstract
Theoretical calculations for the secondary current distributions for the electrode with a projection part in electroplating were performed. Two kinds of electrodes were considered. One is a electrode with the overall conducting surfaces(Case 1) and the other is an electrode in which only a projection part has a conducting surface(Case 2). The effects of applied potential, the ratio of ion exchange current to conductivity, ξ and the aspect ratio on the current distri- bution were examined. The increase of applied current or the value of ξ decreased the uni- formity of current distribution. The small value of aspect ratio resulted the more uniform current distribution and Case 2 showed the better uniformity than Case 2. When this model was applied into an electrode with various projection parts, the local current distribution along the electrode surface were obtained successfully. In this case, the decrease of ξ also increase the uniformity of current distribution as seen previously. Keyword : Electroplating model, Current distribution, Projection part, Uniformity
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