Abstract
Multi-layered nanosized Al2O3/Ge/Si structures manufactured by electron-beam evaporation and annealed at a temperature within the range 700−900◦C are examined using transmission electron microscopy, Raman spectroscopy and X-ray diffraction techniques. The periodic structure with a good layer planarity is confirmed to retain after heat treatment up to 900◦C. At an annealing temperature above 700◦C, nanocrystallites with a bimodal size distribution start to form within initially amorphous Ge layers, the mean size of small crystallites being determined by Ge layer thickness and annealing temperature. An essential loss of Ge from multi-layered structure after 900oC anneal and development of Ge1−x Six solid solution with x up to 0.07 in the nanocrystallites is revealed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
