Abstract
The article provides an overview of the scientific and technical literature in the field of the formation of silicon carbide coatings by chemical vapor deposition (CVD). CVD is a complex process, approaches to which vary depending on the tasks being solved. Depending on the technological parameters it is possible to achieve both the deposition of pure silicon carbide and the co-deposition of silicon and carbon, mixed coating In the article attention is paid to the study of CVD from the point of view of the kinetic and parameters for deposition and thermodynamic.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
