Действие электронного луча на кристаллы и пленки аминиевых и аммониевых солей

Abstract

The results of studying the action of an electron beam on tetramethylethylenediamine nitrilotriacetate crystals [HMe2NCH2CH2NMe2H]2+[HN(CH2COOH)(CH2COO)2]2–, ammonium heptamolybdate tetrahydrate (NH4)6Mo7O24.4H2O, polymeric trihydrate of zinc nitrilotrimethylenephosphonate (ZnH4L•3H2O)n, lamellar crystals of 2,2'-(ethylenedioxy)di(ethylamine) trifluoroacetate CF3C(O)O‒ +H3N(CH2CH2O)2CH2CH2NH3+ ‒O(O)CCF3 and films of the monoethanolamine salt of ethylenediaminetetraacetic acid [Н3NCH2CH2OH]2+[(OOCCH2)2NCH2CH2N(CH2COOH)2]2– are presented. A Tescan VEGA II electron microscope was used as an exposure tool. The microrelief was examined at magnifications from 500x to 50000x. The survey was carried out at an accelerating voltage of 20 kV and a working distance of 2–8 mm, using detectors of secondary electrons (SE) and backscattered electrons (BSE). A copper-nickel alloy and silicate glass were used as the substrate material for the films. Irradiation of crystals and films was carried out by an electron beam of various powers, forming an area 2020 μm in size. At low power, the area dimensions are strictly 2020 microns, the surface remains relatively flat. An increase in power or an increase in exposure while maintaining power causes an increase in size by 5 to 34 %. The maximum impact causes the formation of defects in the form of cracks, swellings, bubbles, holes, and craters. The elevation of the surface increases with increasing radiation dose.