Abstract
The processes of ionization of atoms sputtered under bombardment of clean metal surface by singly and multiply charged ions with kinetic energy of several keV were studied. Within the framework of simple phenomenological model of ion formation, the relaxation of local electron excitation in metal was taking into account. Analytical expressions for estimation of ionization probability of sputtered atoms was obtain. It was shown, that in comparison with singly charged ions, bombardment of metals with multiply charged ions results to significant increase of ionization probability of sputtered atoms due to more efficient excitation of electrons and increase of relaxation time of this excitation.
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