Abstract
The writing process of birefringent structures in the volume of fused silica by focused ultrashort laser pulses with wavelength in visible range and various values of pulse energy, pulse duration, repetition rate, numerical aperture and moving substrate velocity has been studied. The retardance value of fabricated structures has been measured and influence of the subsequent annealing of these structures has been studied. It was shown, that combination of writing layered structures with subsequent annealing provides structures with high homogeneity, required retardance value and high transmittance.
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