Abstract
In present study, the structure, microrelief and optical properties of thick nontransparent chromium films, deposited onto silica and silicon substrates using thermal evaporation from the especial thermostating evaporator, have been evaluated. The top surface layer of the films is amorphous as it is verified by RHEED. When chromium is deposited onto silica, rms parameter of AFM data is equal to 0.7 nm. The dispersive optical constants n and k of chromium films have been defined over spectral range 250-1100 nm by spectroscopic ellipsometry.
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