Abstract
The possibility of copying high-frequency diffraction gratings obtained in a photoresist layer to glass substrates using polymer compositions (“OKM” and “Tekhnovit”) is shown and their comparative analysis is carried out. The mechanism of copying the relief-phase structure is based on a two-stage process consisting of the following steps: obtaining a nickel master, applying a polymer composition to it and curing under the influence of UV radiation. The copying modes were optimized (time, exposure, thickness of the polymer base), and that allowed to obtain relief phase diffraction gratings with a surface relief depth comparable with the initial structure obtained in the photoresist layer. The diffraction efficiency of the resulting gratings was estimated, as well as the change in the depth of the surface relief of polymer copies obtained from one master.
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