Plasmon resonances arise from the collective oscillations of free electrons in conductive media, enabling strong light-matter interactions. In contrast to semiconductors, the plasmonic response of metals is regarded as intrinsically fixed by their large carrier density and electronic structure and therefore relatively insensitive to external perturbations such as mechanical strain. Here, we show conclusive experimental evidence that plasmon resonances in metals can be actively tuned through strain engineering. Using epitaxial ultrathin titanium nitride (TiN) films, we demonstrate that in-plane tensile strain produces a pronounced blue shift of both unscreened and screened plasmon modes relative to unstrained films of identical thickness, with the magnitude of the shift closely tracking the local strain distribution. First-principles calculations reveal that strain modifies the local defect landscape, which alters the electronic structure, governing the plasmonic response. These results establish strain as an effective control knob for plasmonic properties in metals, enabling mechanically reconfigurable plasmonic and nanophotonic platforms.

Incorporating highly conductive TiN significantly improves the rate performance and cycling stability of Si anodes. Si@TiN anode based all-solid-state Li-ion batteries provide a specific capacity of 158.9 mAh g-1 at 0.1C, retain 50.0 mAh g-1 at a high rate of 40C, and exhibit stable cycling for 1000 cycles at 2C.

Nitriding enhances the wear resistance of titanium by forming nitrogen compounds such as TiN and Ti 2 N on its surface layer. However, conventional nitriding requires high temperatures to facilitate the diffusion of nitrogen into the substrate. This study aims to form titanium nitride at room temperature using a novel surface modification technique called scanning cyclic press (SCP). Using SCP, titanium surfaces were scanned under a nitrogen atmosphere using a vibrating indenter that applied cyclic compressive loads. After SCP, we conducted surface observations, nanoindentation testing, electron probe microanalyzer elemental analyses, and transmission electron microscopy (TEM) crystal structure analyses to characterize the modified layer. Surface observations revealed the characteristic golden color of TiN in the modified areas. TEM analyses showed that a nitride layer consisting of aggregated TiN particles was successfully formed on the Ti specimen surfaces, at room temperature. The TiN particles were composed of TiN crystallites with grain sizes of a few nanometers, and a portion of them exhibited partial amorphization. Based on the morphological features and nitrogen diffusion analysis, we determined that this layer is a type of mechanically mixed layer formed by mechanical driving forces rather than thermal diffusion. The formation of the nitride layer is believed to proceed in the following sequence: the exposure of fresh titanium surfaces by vibrational compressive loading from the indenter, creation of TiN clusters via nitrogen chemisorption on the exposed surfaces, ultrafine grain refinement caused by excessive dislocation accumulation from the pinning effect of the TiN clusters, and repeated deposition of TiN particles.

Microstructural Evolution and Wear Resistance Enhancement of Electron-Beam-Fabricated Nickel Titanium Coatings on Titanium by Heat Treatment

This study aimed to assess the individual and combined effects of chitosan and titanium dioxide (TiO2), with and without UV exposure, on delaying ripening, reducing weight loss, and maintaining postharvest quality of mangoes stored at 25 ± 2 °C for up to 12 days. The evaluation focused on changes in physicochemical properties, antioxidant content, in vitro antioxidant activity, and microbial decay. The coating treatments included: 1) control (C), 2) chitosan (CH), 3) CH–TiO2 (CT), 4) control with UV activation (C-UV), 5) CH with UV activation (CH-UV), 6) CT with repeated UV activation (CT-UV), 7) CT with single UV activation (CT-UV1). CT coatings effectively reduced ethylene production (0.19–0.29 μL/kg.h) and respiration rate (50–78 mg CO₂/kg.h), thereby slowing ripening compared to the control. UV activation did not significantly enhance the suppression of ethylene production or respiration. CT coatings also minimized weight loss (8.34–8.47% vs. 12.62% in C), maintained peel color stability, and better preserved physicochemical properties. In addition, CT coatings delayed the decline in titratable acidity (0.18–0.56% on day 12) and slowed the accumulation of total soluble solids (14.75–14.88 °Brix on day 12). Moreover, antioxidant retention was also improved, as indicated by higher total phenolic content (34.65 mg GAE/g) and FRAP values (110.26 μg TE/g). CT-treated mangoes exhibited the lowest incidence of decay (7.57–7.71%), highlighting the antimicrobial potential of TiO2 and supporting its use as an effective strategy to extend the shelf life of mangoes.

Titanium carbide (TiC) and titanium nitride (TiN) crystals are known for their mechanical strength and thermal stability, making them useful where high temperature applications are required. In this study we have discussed that how these materials behave under thermal stress computing their second and third order elastic constants and Gruneisen parameters above room temperature in the temperature range 300 -1000 K. We have used computational approach using python codes based on the formulation originated from quantum mechanics. With the help of these python codes, we computed second and third-order elastic constants taking Coulomb potential as long range potential and Born-Mayer potential as short range potential. The variation in the values of these constants tells us about the material’s response when subjected to stress at elevated temperatures. We also computed absolute value of average Gruneisen parameters along different crystallographic directions <100>, <110> and <111> for longitudinal and shear waves. These parameters determine the lattice anharmonicity, which show how materials response under thermal stress. The values of average Gruneisen parameters for these materials along different crystallographic directions provide the information about the anisotropic behavior in relation to thermodynamic response. These results improve our understanding of how elastic and thermal behaviours interact in the materials under investigation, which further support the development of materials best suited to be used under extreme temperature conditions.

Aqueous zinc-ion batteries (AZIBs) are attractive for grid-scale energy storage owing to their intrinsic safety and low cost. Yet their practical deployment is impeded by Zn dendrites and persistent interfacial instability, which are closely linked to nonuniform Zn2+ flux at the Zn anode-separator interface. Herein, we engineer a titanium nitride (TiN) interlayer at this interface to regulate Zn2+ transport and homogenize ion flux. In situ synchrotron radiation X-ray diffraction (SRXRD) reveals an electrochemical-induced crystallographic reorientation of TiN from a (111)-preferred texture to (200). Density functional theory (DFT) calculations further show that TiN (200) has a lower surface energy, weaker Zn2+ adsorption, and more favorable Zn2+ migration pathways than TiN (111), enabling a dynamically optimized, electrochemically self-adaptive interlayer that progressively equalizes interfacial Zn2+ flux and improves Zn plating/stripping reversibility. As a result, Zn//Zn symmetric cells deliver stable cycling for over 1100 h, while MnO2-based full cells exhibit improved rate capability and long-term capacity retention. This work highlights crystallography-driven interlayer adaptivity as a general strategy for constructing stable interfaces toward safe, durable, and scalable aqueous Zn-ion batteries.

Nonoxide ceramic materials offer excellent thermal, electrical, and mechanical properties; however, their integration with mesoporosity remains fundamentally constrained by high-temperature conversion reactions, which inherently disrupt the mesoscopic order through lattice reconstruction and grain coarsening. Herein, we report a phase-selective precrystallization conversion strategy in which mesostructured rutile TiO2 intermediates are directly constructed, enabling a mesoscale topology-preserving oxide-to-nitride conversion to mesoporous titanium nitride (TiN) microspheres at temperatures as low as 700 °C, substantially below the conventional nitridation conditions (∼1100 °C). Kinetic and thermodynamic analyses reveal that rutile precrystallization simultaneously lowers the activation barrier and shifts the driving force for nitridation, thereby bypassing the conventional anatase-rutile-TiN pathway that disrupts the mesoscopic order. Assisted by a transient carbon scaffold that kinetically suppresses grain coarsening, the conversion proceeds with an exceptionally small volume contraction (∼7.3%), yielding mesoporous TiN frameworks with a high surface area (82 m2 g-1), continuous crystalline pore walls (mean pore size of 17.5 nm), and radial mass-transport pathways. When employed as conductive supports for Ir catalysts, the resulting mesoporous TiN enables strong electronic coupling and structural stabilization under acidic oxygen evolution conditions, delivering high activity (1.64 V at 1.0 A cm-2) and long-term durability over 500 h in proton-exchange membrane water electrolysis at ultralow Ir loadings (∼0.15 mgIr cm-2). This work establishes a phase-selective pathway via precrystallization as a promising strategy for reconciling mesoporosity and crystallinity in nonoxide ceramics.

Titanium nitride (TiN) coatings are widely used as wear‐protection layers on cutting and forming tools due to their high hardness and chemical stability. However, the adhesion of TiN on substrates, such as silicon and steel (1.4301), can be insufficient for a given application. This study investigates the effect of atmospheric pressure plasma pretreatment on the adhesion behavior of TiN coatings. The surface modification is analyzed using confocal laser scanning microscopy after plasma treatment with argon (Ar) and argon/hydrogen (Ar/H 2 ) gas mixtures. Subsequently, the samples are coated by reactive magnetron sputtering. Adhesion performance is evaluated by cross‐cut test, while X‐ray diffraction is employed to detect possible changes in the crystalline structure of the coatings. Plasma treatment deoxidizes and activates the surface, which enhances adhesion between coating and substrate. Ar/H 2 plasma, in particular, significantly improves coating adhesion compared to untreated samples. These findings demonstrate that plasma–surface pretreatment improves coating durability and has the potential to extend tool lifetime in industrial applications.

Hydrogen embrittlement (HE) represents a critical degradation mechanism in carbon steel components operating in hydrogen-rich environments, such as those encountered in clean energy and petrochemical applications. This study evaluates the hydrogen permeation barrier performance of titanium nitride (TiN) nanostructured thin films deposited by High-Power Impulse Magnetron Sputtering (HiPIMS) on SAE 1020 carbon steel substrates. Electrochemical permeation measurements were performed using the Devanathan-Stachurski dual-cell methodology in accordance with ASTM G148 and ISO 17081 standards. Key hydrogen transport parameters quantified include the effective diffusion coefficient (Deff), lag time (tlag), and steady-state hydrogen oxidation current density. The TiN/carbon steel composite system exhibited tlag = 570 s, Deff = (2.68 ± 0.09) × 10-10 m2 s-1 and a steady-state hydrogen oxidation current density of 21.5 µA cm-2, corresponding to a permeation reduction factor (PRF) of 2.32 and a barrier efficiency of η = 56.9%. The superior barrier performance is attributed to the dense, low-defect microstructure characteristic of HiPIMS deposition. These results validate HiPIMS-deposited TiN as a robust hydrogen diffusion barrier, with the established performance metrics providing quantitative benchmarks for the design of hydrogen-resistant coatings in energy applications.

Abstract Titanium nitride (TiN) thin films were fabricated by combinatorial reactive sputtering with Ar/N₂ ratios varied from 0% to 100% to clarify how deposition conditions govern crystallographic orientation and thermoelectric properties at 300 K. While film composition remained nearly constant except under N-free conditions, crystallographic orientation, grain structure, and transport properties changed markedly with nitrogen fraction. X-ray diffraction revealed two orientation transition regimes at approximately 70% and 40% N₂. The Seebeck coefficient increased with decreasing nitrogen fraction and showed weak orientation dependence, whereas electrical resistivity strongly correlated with orientation-dependent peak intensities, partially decoupling the conventional trade-off between these parameters. Orientation- and grain-dependent thermal conductivity further contributed to performance optimization, yielding a maximum dimensionless figure of merit of 0.025. These results demonstrate that deposition-driven orientation engineering provides a robust pathway for improving nitride thin-film thermoelectrics at room temperature.

Chalcogenide-based ovonic threshold switching (OTS) selectors are essential for high-density memory and computing applications, yet their switching mechanisms remain controversial due to the lack of direct structural evidence in amorphous materials. In this study, titanium nitride (TiN) diffusion is utilized as a natural tracer to map the spatial location of conductive pathways in As2Se3-based OTS devices using four-dimensional scanning transmission electron microscopy combined with angstrom-beam electron diffraction. The results reveal that TiN clusters from the electrode form continuous conductive pathways within the amorphous matrix, thereby providing direct evidence for filamentary switching behavior. Further, by the introduction of a carbon interfacial layer to control diffusion, an ultralow leakage current of 8 pA is achieved in As2Se3-based OTS devices. This work not only advances the fundamental understanding of switching mechanisms in OTS devices but also offers practical design guidance for developing highly reliable selectors in the memory community.

Gamma radiation shielding characteristics of some nitrides: a Monte–Carlo simulation study

To address the issues of high cutting temperatures and severe tool wear during titanium alloy machining, this study proposes a hybrid surface modification strategy combining micro-textures and multicomponent titanium nitride (TiN)-based coatings on cemented carbide tools. Using YG8 cemented carbide as the substrate, micro-dimple textures were fabricated by fiber laser, and three coatings with different architectures (TiAlSiN, TiSiN/TiAlN, and TiSiN/TiAlSiN/TiAlN) were deposited via multi-arc ion plating technology. Based on a two-factor (texture diameter and texture spacing) and three-level orthogonal experiment, the evolution behaviors of surface morphology, phase composition, and mechanical properties of the textured multicomponent TiN-based coatings were systematically characterized and comparatively analyzed. The results reveal that: compared to the monolithic-structured TiAlSiN coating, the TiSiN/TiAlSiN/TiAlN and TiSiN/TiAlN composite coatings with multilayered composite structures can effectively relieve the residual stress inside the film–substrate system, and significantly suppress the phenomena of coating cracking and localized spallation caused by irregular protrusions of the recast layer at the micro-texture edges. X-ray diffraction (XRD) and crystallite size analyses indicate that the amorphous Si3N4 phase promoted by the Si element in the composite coatings effectively impedes the growth of TiN columnar crystals, achieving significant grain refinement. Mechanical property tests confirm that the existence of multicomponent composite interfaces effectively hinders dislocation movement. Among them, the textured TiSiN/TiAlSiN/TiAlN composite coating exhibits the optimal comprehensive performance; its microhardness, nanohardness, and H/E ratio (characterizing the resistance to plastic deformation) are increased by 17.94%, 8%, and approximately 45%, respectively, compared to those of the textured TiAlSiN coating. This study deeply elucidates the synergistic strengthening and toughening mechanisms between micro-texture parameters and the internal structures of the coatings, providing important theoretical guidance and experimental data support for the surface design of long-lifespan tools oriented towards the high-efficiency machining of titanium alloys.

Abstract The metal filling of three-dimensional (3D) memory affects the electrical performance of the device. This investigation focuses on optimizing the atomic layer deposition (ALD) process for titanium nitride (TiN) films, which serve as critical interconnects in high-density 3D memory devices. By targeting reduced surface roughness and low electrical resistivity, we conducted a systematic analysis of key deposition parameters-including substrate temperature, purge duration, and precursor dosing sequences-to mitigate lateral seam defects and enhance vertical channel uniformity. Our findings revealed an inverse correlation between substrate temperature and surface roughness, alongside consequential resistivity trade-offs; these were effectively mitigated through precise thermal tuning and optimized purge conditions, leveraging the self-limiting growth mechanism of ALD for superior film conformity on complex structures. Additionally, pre-treatment techniques such as degassing were integrated to minimize contaminants, further improving interface quality. This optimized approach enables scalable fabrication of higher-density 3D memory architectures with enhanced reliability and yield, advancing next-generation semiconductor technology.

The development of multilayer coatings based on titanium carbides and nitrides remains one of the most active areas in materials science, owing to their ability to markedly enhance wear resistance and extend the service life of machine components. Particular interest is currently focused on tailoring conventional TiN/TiCN architectures through alloying metal additions. In this study, the tribological and mechanical performance of aluminum- and zirconium-doped TiN/TiCN multilayer coatings deposited by direct-current magnetron sputtering onto 41Cr4 steel was investigated. The morphology, elemental distribution, and phase constitution of the multilayer coatings were examined. It is shown that increasing the number of bilayers from two to four in TiN/TiCN–based multilayer coatings leads to improved tribomechanical characteristics. It was determined that zirconium provides a more pronounced beneficial effect than aluminum. The four-bilayer TiZrN/TiZrCN coating simultaneously exhibited the lowest coefficient of friction (0.11) and wear rate (10−6 mm3 m−1 N−1) at a hardness of 16.4 GPa.

We numerically investigate plasmonic metasurface absorbers based on hollow square, hollow cylindrical, and conical nanoantenna geometries fabricated from various plasmonic materials, with emphasis on titanium nitride (TiN) as a refractory alternative to noble metals. Full-wave finite-element simulations in the visible range reveal geometry- and material-dependent absorption behavior, where TiN designs exhibit strong broadband absorption and reduced sensitivity to geometrical variations within the studied parameter space. Fitted analytical models are developed to describe the dependence of wavelength-averaged absorption (400–800 nm) on key structural parameters, enabling reliable performance prediction and efficient optimization. The results show that the intrinsic optical losses and damping properties of TiN support broadband absorption and fabrication tolerance for the examined geometries. This work provides a quantitatively supported framework for designing optimized plasmonic metasurface absorbers for applications such as solar energy harvesting, optical sensing, photothermal conversion, and radiative thermal management.

This study investigated the antifungal performance of copper-based antimicrobial coatings developed by Gencoa Ltd., previously validated against bacterial ESKAPE pathogens, alongside newly formulated titanium oxide coatings, against key agricultural fungal pathogens: Alternaria alternata, Botrytis cinerea, Cladosporium cucumerinum, and Fusarium oxysporum. Testing was conducted both in vitro and in field trials within an actively used polytunnel. In vitro assays included a modified ISO 846 agar plate protocol and a six-well plate fungal colonization assay simulating high humidity conditions. Field trials assessed coating performance under real-world exposure. Copper-containing coatings: pure copper, copper oxynitride, and copper-doped titanium oxide, consistently demonstrated significant antifungal activity, effectively reducing spore germination and colonization. Titanium oxide coatings without copper showed minimal effect, performing similarly to uncoated polyethylene. While copper-based coatings were highly effective, some susceptibility to surface degradation under prolonged moisture was observed. However, antifungal activity often persisted in degraded areas of samples with high copper content. Copper-based antimicrobial coatings offer strong potential for preventing fungal colonization on agricultural surfaces, outperforming titanium oxide formulations under both laboratory and field conditions. Optimization to enhance durability will further improve their suitability for long-term use in protected cultivation systems.

ABSTRACT Titanium nitride (TiN) is a versatile ceramic material renowned for its high hardness, excellent electrical conductivity, and plasmonic effects, yet its performance is highly dependent on its stoichiometry ( x in TiN x ). The synthesis of near‐stoichiometric TiN powder (0.98 ≤ x ≤ 1.01), which exhibits optimal properties, remains challenging due to a mismatch between mass transfer and reaction kinetics. Herein, we developed a novel fluidized‐bed process involving the controlled formation and subsequent dechlorination of a stoichiometric TiNCl coating on seed particles, achieving a final stoichiometry of x = 0.99. The introduction of NH 3 was identified as a critical step for effectively reducing residual chlorine impurity. Furthermore, a self‐exfoliation mechanism during the transformation from TiNCl to TiN was revealed. This precursor stoichiometry locking strategy, combined with a fluidized‐bed process, not only achieves a 161‐fold improvement in dechlorination efficiency over the fixed‐bed system but also exhibits a high synthesis rate (∼13 g h −1 in a 30 mm‐diameter reactor), demonstrating great promise for the scalable production of near‐stoichiometric TiN powder.

Abstract Surface plasmons (SPs) in refractory materials like titanium nitride (TiN) offer promising alternatives to noble metals for plasmonic applications due to their robustness and CMOS compatibility. However, the dispersion behavior of SPs at the surface of TiN in the non-retarded regime remains poorly understood. Here, we employ momentum-resolved high-resolution electron energy loss spectroscopy to investigate the collective electronic excitations of atomically flat TiN(111) thin films treated by Ar + sputtering and annealing. Two distinct excitations are observed: a SP mode near 2 eV and a defect-induced interband transition (IT) mode around 1 eV. The SP exhibits an anisotropic, anomalous dispersion: negative at small momenta ( q < 0.03 Å -1 along ΓM and q < 0.025 Å -1 along ΓK), transitioning to positive at larger momenta. The spectral weight of the IT shows an opposite momentum dependence to the SP energy. Assisted by a Drude-Lorentz dielectric model incorporating the momentum-dependent IT oscillator strength, we demonstrate that the anomalous SP dispersion arises from q-dependent screening by defect states. These findings highlight defect engineering as a strategy for tailoring plasmonic properties in refractory nitrides, with implications for integrated photonics and sensing applications.