Carbon-phototransistor with a structure of vertically grew graphene nanosheets embedded carbon (GNEC) film is fabricated through an electron-assisted sputtering-deposition method. This heterojunction phototransistor of GNEC/n-Si exhibits broad detection range (from 450 nm to 1200 nm), high photoresponsivity (1.298 × 104 A/W), and rapid response to on-off optical signals (4.91 μs). Driven by the source-drain voltage applied to the GNEC film, electrons recycle in the circuit before recombination, which enhance drastically the usage efficiency of photo-induced carriers. Besides, GNEC film contains a large amount of graphene edges, which may serve as electron pump in the photovoltaic process based on the e-h separation in the p-n junction. The GNEC/n-Si phototransistor improves the responsivity of ∼103 order compared with that of photodiode mode.
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