Molecular layer deposition of hybrid organic–inorganic thin films called “tincones” is achieved using tetrakisdimethylaminotin as the metal precursor and glycerol (GL) as the organic reactant. The GL-based process displays linear growth and self-limiting surface reactions in a broad temperature window ranging from 75 to 200 °C. At higher temperatures, no film growth is possible. The growth per cycle decreases rapidly with increasing temperature from 1.3 Å at 75 °C to less than 0.1 Å at 200 °C. The films are observed to be smooth with scanning electron microscopy and atomic force microscopy. The hybrid organic–inorganic nature of the films is visible in both infrared spectroscopy and x-ray photoelectron spectroscopy. As deposited tincone films are annealed in reducing (H2), inert (He), or oxidizing (O2) atmospheres. In situ x-ray diffraction is employed to study the crystallization of the films during annealing. Tincone films annealed in reducing or inert atmosphere crystallize into a tetragonal SnO phase at 388 and 410 °C, respectively. These temperatures are lower than the crystallization temperature of 480 °C for atomic layer deposition (ALD) tin oxide films annealed in H2. Tincone films annealed in oxygen crystallize into an SnO2 phase at a temperature of 523 °C, which is similar to the crystallization temperature for ALD tin oxide films annealed in He or O2. This reduced temperature for crystallization into SnO for the tincone films is interesting since SnO is one of the few metal oxides known as a p-type semiconductor material.
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