This chapter addresses the occurrence, behavior, and treatment of nanosized (<100 nm) alumina, ceria, and amorphous silica particles in the wastewater generated from chemical mechanical planarization (CMP) processes during the manufacture of semiconductor wafers. The chapter is primarily directed to engineers who may need to design and/or operate wastewater treatment processes in semiconductor manufacturing facilities (fabs). The composition of CMP slurry wastewaters is described, along with the principal physical and chemical processes that influence the behavior of alumina, ceria, and silica particles in an aqueous system. Key unit operations that may be applicable to the removal of nanosized particles from wastewaters are described, including coagulation, flocculation, sedimentation, filtration, flotation, electrocoagulation, and biological wastewater treatment. The engineered application of these unit operations to the removal of nanosized particles is currently gated by the limited availability of information on actual performance and operational experience. Key research needs are described, including the need for validated analytical methods for measuring nanoparticle fate and behavior in complex waste streams, as well as for evaluating the long-term stability of nanoparticles in the solid concentrates that are produced by wastewater treatment.
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