Misfit Arrays Research Articles

Direct Integration of GaSb with GaAs(111)A Using Interfacial Misfit Arrays

Direct Integration of GaSb with GaAs(111)A Using Interfacial Misfit Arrays

Development of MOVPE grown GaSb-on-GaAs interfacial misfit solar cells

GaSb grown on GaAs through interfacial misfit (IMF) arrays grown via molecular beam epitaxy has been heavily studied; there is limited research, however, on IMF growth through metal-organic vapor phase epitaxy. To demonstrate viability for integration in a multijunction solar cell for terrestrial use, it is imperative to demonstrate high quality GaSb grown on GaAs through metal-organic vapor phase epitaxy. The preferred gallium precursors for n-type and p-type GaSb for longest minority carrier diffusion length were determined to be trimethylgallium and triethylgallium, respectively. A heteroepitaxial GaSb-on-GaAs device attained an open-circuit voltage of 190 mV and an efficiency of 2.2%. Extracted threading dislocation density from the minority carrier lifetime for the heteroepitaxial GaSb-on-GaAs device was determined to be 7.5×106cm−2. In a modeled multijunction solar cell, this device attributes to an overall efficiency of 33.1% under AM1.5g illumination.

Dislocation analysis of epitaxial InAsSb on a metamorphic graded layer using x-ray topography

Dislocations in compositionally graded virtual substrates and InAsSb epitaxial layers for long wavelength (8–12 μm) photodetectors have been investigated with high-resolution x-ray topography (XRT). By varying the imaging conditions, the properties of the virtual substrate and InAsSb could be individually characterized. We observe the formation of misfit dislocations near the interface predominantly along the (110) direction and with less relaxation along the (1–10) direction. The misfit dislocations do not form a uniform array of dislocations but rather appear as dislocation bundles. Threading dislocation clusters, which could limit device performance, are observed along the misfit arrays with a density ∼1 × 105 cm−2 and a total averaged density of less than 1 × 106 cm−2. The prospects for using XRT for further optimization of virtual substrate and development of low defect bulk InAsSb layers are discussed.

Metamorphic Integration of GaInAsSb Material on GaAs Substrates for Light Emitting Device Applications.

The GaInAsSb material has been conventionally grown on lattice-matched GaSb substrates. In this work, we transplanted this material onto the GaAs substrates in molecular beam epitaxy (MBE). The threading dislocations (TDs) originating from the large lattice mismatch were efficiently suppressed by a novel metamorphic buffer layer design, which included the interfacial misfit (IMF) arrays at the GaSb/GaAs interface and strained GaInSb/GaSb multi-quantum wells (MQWs) acting as dislocation filtering layers (DFLs). Cross-sectional transmission electron microscopy (TEM) images revealed that a large part of the dislocations was bonded on the GaAs/GaSb interface due to the IMF arrays, and the four repetitions of the DFL regions can block most of the remaining threading dislocations. Etch pit density (EPD) measurements indicated that the dislocation density in the GaInAsSb material on top of the buffer layer was reduced to the order of 106 /cm2, which was among the lowest for this compound material grown on GaAs. The light emitting diodes (LEDs) based on the GaInAsSb P-N structures on GaAs exhibited strong electro-luminescence (EL) in the 2.0–2.5 µm range. The successful metamorphic growth of GaInAsSb on GaAs with low dislocation densities paved the way for the integration of various GaInAsSb based light emitting devices on the more cost-effective GaAs platform.

Growth and characterization of InSb on (1 0 0) Si for mid-infrared application

Monolithic integration of InSb on (100) Si is a practical approach to realizing on-chip mid-infrared photonic devices. An InSb layer was grown on a (100) Si substrate using an AlSb/GaSb buffer containing InSb quantum dots (QDs). The growth process for the buffer involved the growth of GaSb on Si using an interfacial misfit array, followed by InSb QDs on AlSb to decrease the density of microtwins. InSb layers were separately grown on AlSb and GaSb surfaces to compare the effect of different interfacial misfit arrays. The samples were characterized using transmission electron microscopy and X-ray diffraction to determine the structural properties of the buffer and InSb layers. The InSb on the AlSb sample exhibited higher crystal quality than the InSb on GaSb sample due to a more favorable arrangement of interfacial misfit dislocations. Hall measurements of unintentionally doped InSb layers demonstrated a higher carrier mobility in the InSb on the AlSb sample than in InSb on GaSb. Growing InSb on AlSb also improved the photoresponsivity of InSb as a photoconductor on Si.

GaSb solar cells grown on GaAs via interfacial misfit arrays for use in the III-Sb multi-junction cell

Growth of GaSb with low threading dislocation density directly on GaAs may be possible with the strategic strain relaxation of interfacial misfit arrays. This creates an opportunity for a multi-junction solar cell with access to a wide range of well-developed direct bandgap materials. Multi-junction cells with a single layer of GaSb/GaAs interfacial misfit arrays could achieve higher efficiency than state-of-the-art inverted metamorphic multi-junction cells while forgoing the need for costly compositionally graded buffer layers. To develop this technology, GaSb single junction cells were grown via molecular beam epitaxy on both GaSb and GaAs substrates to compare homoepitaxial and heteroepitaxial GaSb device results. The GaSb-on-GaSb cell had an AM1.5g efficiency of 5.5% and a 44-sun AM1.5d efficiency of 8.9%. The GaSb-on-GaAs cell was 1.0% efficient under AM1.5g and 4.5% at 44 suns. The lower performance of the heteroepitaxial cell was due to low minority carrier Shockley-Read-Hall lifetimes and bulk shunting caused by defects related to the mismatched growth. A physics-based device simulator was used to create an inverted triple-junction GaInP/GaAs/GaSb model. The model predicted that, with current GaSb-on-GaAs material quality, the not-current-matched, proof-of-concept cell would provide 0.5% absolute efficiency gain over a tandem GaInP/GaAs cell at 1 sun and 2.5% gain at 44 suns, indicating that the effectiveness of the GaSb junction was a function of concentration.

Effect of in situ annealing on the structural and electrical properties and infrared photodetection of III-Sb on GaAs using interfacial misfit array

Abstract This work presents the effects of in situ thermal annealing under antimony overpressure on the structural, electrical, and optical properties of III-Sb (GaSb and InSb) grown on (100) GaAs using an interfacial misfit array to accommodate the lattice mismatch. Both the sample growth and the in situ thermal annealing were carried out in the in the molecular beam epitaxy system, and the temperature of the as-grown sample was increased to exceed its growth temperature during the annealing. X-ray diffraction demonstrates nearly fully relaxed as-grown and annealed III-Sb layers. The optimal annealing temperatures and durations are for 590 °C, 5 min for GaSb and 420 °C, 15 min for InSb, respectively. In situ annealing decreased the surface roughness of the III-Sb layers. X-ray reciprocal space mapping and transmission electron microscopy observation showed stable interfacial misfit arrays, and no interfacial diffusion occurred in the annealed III-Sb layers. A Hall measurement of unintentionally doped III-Sb layers showed greater carrier mobility and a lower carrier concentration in the annealed samples at both 77 and 300 K. In situ annealing improved the photoresponsivity of GaSb and InSb photoconductors grown on GaAs in the near- and mid-infrared ranges, respectively.

Solid solution strengthening in GaSb/GaAs: A mode to reduce the TD density through Be-doping

The need for a low bandgap semiconductor on a GaAs substrate for thermophotovoltaic applications has motivated research on GaSb alloys, in particular, the control of plastic relaxation of its active layer. Although interfacial misfit arrays offer a possibility of growing strain-free GaSb-based devices on GaAs substrates, a high density of threading dislocations is normally observed. Here, we present the effects of the combined influence of Be dopants and low growth temperature on the threading dislocation density observed by Transmission Electron Microscopy. The Be-related hardening mechanism, occurring at island coalescence, is shown to prevent dislocations to glide and hence reduce the threading dislocation density in these structures. The threading density in the doped GaSb layers reaches the values of seven times less than those observed in undoped samples, which confirms the proposed Be-related hardening mechanism.

Effects of surface reconstruction on the epitaxial growth of III-Sb on GaAs using interfacial misfit array

The effects of pre-growth Sb reconstruction on a GaAs surface on the epitaxial growth of III-Sb (GaSb and InSb) on a (100) GaAs substrate using interfacial misfit array were investigated. All samples exhibited smooth surface with a root mean square (r.m.s.) roughness below 1.5nm and nearly 100% relaxation. Modeling indicated that the distribution and types of misfit dislocations can be evaluated using a reciprocal space map (RSM) of the x-ray measurements. The interfacial misfit (IMF) arrays in III-Sb/GaAs samples were characterized by RSMs of high-resolution x-ray diffraction (XRD) and transmission electron microscopy (TEM). The RSM results suggest that all samples exhibited highly uniformly distributed misfit dislocations, and pre-growth (2×8) Sb surface reconstruction promoted the formation of 90° dislocations in an IMF array. Hall measurements of unintentionally doped GaSb and InSb layers also suggested that the highest motilities at both 77K and 300K were achieved at the samples grown on GaAs with pre-growth (2×8) Sb reconstruction.

Characterization of 6.1 Å III–V materials grown on GaAs and Si: A comparison of GaSb/GaAs epitaxy and GaSb/AlSb/Si epitaxy

GaSb p–i–n photodiodes were grown on GaAs and Si, using interfacial misfit arrays, and on native GaSb. For the samples grown on GaAs and Si, high-resolution transmission electron microscopy images revealed interface atomic periodicities in agreement with atomistic modeling. Surface defect densities of ~1×108cm−2 were measured for both samples. Atomic force microscopy scans revealed surface roughnesses of around 1.6nm, compared with 0.5nm for the sample grown on native GaSb. Dark current and spectral response measurements were used to study the electrical and optoelectronic properties of all three samples.

GaSb thermophotovoltaic cells grown on GaAs by molecular beam epitaxy using interfacial misfit arrays

There exists a long-term need for foreign substrates on which to grow GaSb-based optoelectronic devices. We address this need by using interfacial misfit arrays to grow GaSb-based thermophotovoltaic cells directly on GaAs (001) substrates and demonstrate promising performance. We compare these cells to control devices grown on GaSb substrates to assess device properties and material quality. The room temperature dark current densities show similar characteristics for both cells on GaAs and on GaSb. Under solar simulation the cells on GaAs exhibit an open-circuit voltage of 0.121 V and a short-circuit current density of 15.5 mA/cm2. In addition, the cells on GaAs substrates maintain 10% difference in spectral response to those of the control cells over a large range of wavelengths. While the cells on GaSb substrates in general offer better performance than the cells on GaAs substrates, the cost-savings and scalability offered by GaAs substrates could potentially outweigh the reduction in performance. By further optimizing GaSb buffer growth on GaAs substrates, Sb-based compound semiconductors grown on GaAs substrates with similar performance to devices grown directly on GaSb substrates could be realized.

GaAs and AlGaAs APDs with GaSb absorption regions in a separate absorption and multiplication structure using a hetero-lattice interface

Interfacial misfit (IMF) arrays were used to create two APD structures, allowing GaSb absorption layers to be combined with wide-gap multiplication regions, grown using GaAs and Al0.8Ga0.2As, respectively. The GaAs APD represents a proof-of-principle, which is developed in the Al0.8Ga0.2As APD to achieve reduced dark currents, of 5.07μAcm−2 at 90% of the breakdown voltage, and values for effective k=β/α below 0.2. A random-path-length (RPL) simulation was used to model the excess noise in both structures, taking into account the effects of dead space. It is envisaged that the GaSb absorption regions could be replaced with other materials from the 6.1Å family, allowing for long-wavelength APDs with reduced dark currents and excess noise.

Excess noise in GaAs and AlGaAs avalanche photodiodes with GaSb absorption regions—composite structures grown using interfacial misfit arrays

Interfacial misfit arrays were embedded within two avalanche photodiode (APD) structures. This allowed GaSb absorption layers to be combined with wide-bandgap multiplication regions, consisting of GaAs and Al0.8Ga0.2As, respectively. The GaAs APD represents the simplest case. The Al0.8Ga0.2As APD shows reduced dark currents of 5.07 μAcm−2 at 90% of the breakdown voltage, and values for effective k=β/α below 0.2. Random-path-length modeled excess noise is compared with experimental data, for both samples. The designs could be developed further, allowing operation to be extended to longer wavelengths, using other established absorber materials which are lattice matched to GaSb.

Spectral and Transient Luminescence Measurements on GaSb/AlGaSb Quantum Wells Grown on GaSb/GaAs Heterojunctions with and without Interfacial Misfit Arrays

Growth of 90° interfacial-misfit-dislocation (IMF) array at heterointerfaces offers low dislocation densities in highly mismatched heterostructures such as GaSb/GaAs. We investigated time-integrated and time-resolved photoluminescence (PL) properties of a GaSb/AlGaSb quantum well (QW) structure grown on (001) GaAs substrate with and without IMF array at the GaSb-buffer/GaAs interface. Our observation reveals that the low-temperature PL from the QW with IMF is twice more intense than that of the QW without IMF, indicating higher quantum efficiency with IMF. The QW with IMF also exhibited the band filling effect at higher excitation power revealed from the spectrally resolved PL decay measurements. These results are the indication of subdued dislocation density with the IMF growth mode. Our PL measurement results along with supportive band-structure calculation of the GaSb/AlGaSb QW show that the luminescence efficiency of the present QW structure is limited by the hole leakage at elevated temperature. Therefore the IMF effect will be more clearly demonstrated by replacing the heterostructure with the one with higher band-offsets.

Characterization of GaSb/GaAs interfacial misfit arrays using x-ray diffraction

We report a nondestructive, large-area method to characterize dislocation formation at a highly lattice-mismatched interface. The analysis is based on x-ray diffraction and reciprocal space mapping using a standard, lab-based diffractometer. We use this technique to identify and analyze a two-dimensional array of 90° misfit dislocations at a GaSb/GaAs interface. The full width at half maximum of the GaSb 004 reciprocal lattice point is shown to decrease with increasing GaSb epilayer thickness, as expected from theoretical models. Based on these measurements, the variation in the spatial dislocation frequency is calculated to be 1%.

Dislocation reduction of GaSb on GaAs by metalorganic chemical vapor deposition with epitaxial lateral overgrowth

Dislocations of GaSb on GaAs substrates stripe-patterned with SiO 2 were reduced by using epitaxial lateral overgrowth (ELO) method. The properties of ELO GaSb layers were studied by means of transmission electron microscopy (TEM) and X-ray diffraction (XRD). In the TEM image with magnification of 15,000, dislocations were not observed with ELO GaSb, while its density was estimated to be 5 × 10 8 cm - 2 in seed region. Interfacial misfit arrays were formed at the openings of the mask with space of 54 Å, which is close to the value expected from 7.8% lattice mismatch between GaSb and GaAs substrate. The XRD rocking curves also indicate the superior crystalline quality of ELO GaSb layers.

GaSb quantum-well-based “buffer-free” vertical light emitting diode monolithically embedded within a GaAs cavity incorporating interfacial misfit arrays

The authors demonstrate a monolithic, electrically injected, vertically emitting GaSb∕AlGaSb light emitting diode (LED) emitting at 1.6μm comprised of a hybrid GaAs∕GaSb-based structure. The LED is comprised of a GaSb∕AlGaSb quantum well/barrier active region embedded within high index contrast GaAs∕AlGaAs distributed Bragg reflectors (DBRs) using two interfacial misfit (IMF) arrays to relieve the strain induced from the high 8% lattice mismatch between the material systems. The first IMF is formed under compressive strain conditions to enable strain-free, defect-free deposition of GaSb active region directly on the lower GaAs∕AlAs DBRs without need for thick buffer. The second IMF is formed under tensile conditions to enable the upper GaAs∕AlAs DBRs on the GaSb active region. The device demonstrates a maximum output power of 3.5μW. Initial diode optical and electrical characteristics along with IMF band structure are discussed.

Strain relief by periodic misfit arrays for low defect density GaSb on GaAs

We demonstrate the growth of a low dislocation density, relaxed GaSb bulk layer on a (001) GaAs substrate. The strain energy generated by the 7.78% lattice mismatch is relieved by a periodic array of 90° misfit dislocations. The misfit array is localized at the GaSb∕GaAs interface and has a period of 5.6nm which is determined by transmission electron microscope images. No threading dislocations are visible. The misfits are identified as 90°, rather than 60°, using Burger’s circuit analysis, and are therefore not associated with generation of threading dislocations. A low dislocation density and planar growth mode is established after only 3 monolayers of GaSb deposition as revealed by reflection high-energy electron diffraction patterns. Calculations corroborate the materials characterization and indicate the strain energy generated by the 7.78% lattice mismatch is almost fully dissipated by the misfit array. The low dislocation density bulk GaSb material on GaAs enabled by this growth mode will lead to new devices, especially in the infrared regime, along with novel integration schemes.

Dislocation Models for Strengthening in Nanostructured Metallic Multilayers

ABSTRACTUltra-high strength metallic multilayers are ideal for investigating the effects of length scales in plastic deformation of metallic materials. Experiments on model systems show that the strengths of these materials increase with decreasing bilayer period following the Hall-Petch model. However, as the layer thickness is reduced to the nm-scale, the number of dislocations in the pile-up approaches one and the pile-up based Hall-Petch model ceases to apply. For nm-scale semi-coherent multilayers, we hypothesize that plastic flow occurs by the motion of single dislocation loops, initially in the softer layer, that deposit misfit type dislocation arrays at the interface and transfer load to the harder phase. The stress concentration eventually leads to slip in the harder phase, overcoming the resistance from the misfit arrays at the interface. A model is developed within the framework of classical dislocation theory to estimate the strengthening from this mechanism. The model predictions are compared with experimentally measured strengths.

Factors affecting the formation, uniformity, and density of misfit and threading dislocation arrays during heteroepitaxial growth

An improved theory relating the separation of misfit dislocations in a heteroepitaxial thin film undergoing a continuous process of strain relaxation by the introduction of dislocations is presented. Because it provides a quantitative relationship between the dislocation spacing, misfit, total system energy, and film thickness, a number of quantities such as energy gain on formation of the dislocation network as a function of dislocation spacing can be estimated. The model allows calculation of useful thermodynamic quantities such as the compressibility of the misfit array which are useful for determining the average spacing of dislocations, the thickness at which dislocations are introduced (the critical thickness), and the dispersion in dislocation spacings in arrays.