Metrology Techniques Research Articles

Evaluation of a new calibration method for bilirubinometers measurements.

Although bilirubin meters are still continuously widely used to screen neonatal jaundice worldwide, they still need a metrological calibration method to evaluate the measurement accuracy of these kinds of devices. In this article, the author describes a new calibration method for evaluation of the bilirubinometers measurements and evaluates the results with one of the most common statistical metrological techniques to establish and evaluate the calibration method; the techniques are x̄ and R control charts. The method mainly depends on establishing a correlation between two units, the bilirubin unit (mg/dl) and one of the metrological standard SI units, the irradiance (W/cm2), experimentally to achieve the calibration method. The study results showed that the estimated correlation coefficient of irradiance response to the bilirubinometer under test was around 0.80, which is a primary indication that the method is a considerably valid technique. In addition, the calibration method was evaluated by the statistical parameters x̄ and R control charts, and the results concluded that the variability calibration process is stable, controlled, and hence could be promisingly utilized to evaluate various bilirubinometers with satisfied accuracy and precision in measurements.

Spectrally Resolved Hong-Ou-Mandel Interferometry with Discrete Color Entanglement

Hong-Ou-Mandel (HOM) interferometry is a powerful quantum metrology technique to reconstruct the surface-depth profile of transparent samples with complementary benefits of measurement precision and experimental robustness. It is generally assumed that a trade-off exists between the standard HOM interferometry sensitivity and its ambiguity-free dynamic range. Here we challenge this ``well-known'' assumption through the implementation of spectrally resolved HOM interferometry with discrete color entanglement, and show that the well-separated frequencies embedded in a quantum state suffices to achieve great advantages in enhancing the temporal resolution but without limiting its ambiguity-free dynamic range. Backed by the Fisher-information analysis, spectrally resolved coincidence detection is an optimal measurement strategy as it enables us to recover the quantum Cram\'er-Rao bound. These results may significantly facilitate the use of spectrally resolved quantum interference for real-time quantum information processing, such as ultrafast phase transition and spectral-temporal photography.

In-situ calibration of the objective lens of an angle-resolved scatterometer for nanostructure metrology.

Due to the advantages of being non-contact, non-destructive, highly efficient, and low in cost, scatterometry has emerged as a powerful technique for nanostructure metrology. In this paper, we propose an angle-resolved scatterometer composed of a scattered light acquisition channel and a spatial imaging channel, which is capable of detecting multi-order diffracted light in a single measurement. Since the high numerical aperture objective lens is usually employed in an angle-resolved scatterometer, the polarization effect of the objective lens introduced by the non-normal incidence and installation stress should be considered. An in-situ calibration method for the objective lens's polarization effects is proposed, in which a known analyzer is appended to the output light path to enable the extraction of the ellipsometric parameters of isotropic samples. Then the polarization effect of the objective lens can be determined in-situ by fitting the measured ellipsometric parameters to the calculated ones. With the objective lens polarization effect being considered, significant improvements in the accuracy and repeatability precision can be achieved in the metrology of the film thickness and grating topography parameters.

Training procedure for scanning electron microscope 3D surface reconstruction using unsupervised domain adaptation with simulated data

Accurate metrology techniques for semiconductor devices are indispensable for controlling the manufacturing process. For instance, the dimensions of a transistor’s current channel (fin) are an important indicator of the device’s performance regarding switching voltages and parasitic capacities. We expand upon traditional 2D analysis by utilizing computer vision techniques for full-surface reconstruction. We propose a data-driven approach that predicts the dimensions, height and width (CD) values, of fin-like structures. During operation, the method solely requires experimental images from a scanning electron microscope of the patterns concerned. We introduce an unsupervised domain adaptation step to overcome the domain gap between experimental and simulated data. Our model is further fine-tuned with a height measurement from a second scatterometry sensor and optimized through a tailored training scheme for optimal performance. The proposed method results in accurate depth predictions, namely 100% accurate interwafer classification with an root-mean-squared error of 0.67 nm. The R2 of the intrawafer performance on height is between 0.59 and 0.70. Qualitative results also indicate that detailed surface features, such as corners, are accurately predicted. Our study shows that accurate z-metrology techniques can be viable for high-volume manufacturing.

Effects of growth temperature on structural and electrical properties of in-rich InAlN–GaN heterostructures by radio-frequency metal–organic molecular beam epitaxy

In-rich InAlN is a promising nitride semiconductor alloy for high-efficiency solar cells and wide-range light-emitting diodes due to its tunable bandgap from 0.7 to 6.2 eV. However, incomplete characterization has led to inconsistent fundamental properties in some studies. The aim of this study was to comprehensively investigate the structural, optical, and electrical properties of In-rich InAlN films grown on GaN/Al2O3 templates by RF-MOMBE at various temperatures. The methodology involved state-of-the-art metrology techniques, such as high-resolution x-ray diffraction (HRXRD), scanning electron microscopy (FE-SEM), Hall effect measurements, and transmission electron microscopy (TEM). The results showed that all InxAl1-xN films were epitaxially grown on the GaN/Al2O3 template, with the indium composition (x) decreasing with increasing growth temperature. Furthermore, phase separation of the In-rich InAlN films occurred at high growth temperatures(>550 °C), resulting in a relatively smooth surface. The optical absorption method measured the band-gap of the InxAl1-xN films, which ranged from 1.7 to 1.9 eV for x values between 0.77 and 0.91. The mobility and carrier concentrations of all In-rich InAlN films were measured at ∼60−277 cm2 V−1-s−1 and 2–7 × 1019 cm3 in the growth temperature of range 450 °C–610 °C, respectively. In conclusion, our comprehensive characterization using advanced metrology methods provides valuable insights into the properties of In-rich InAlN films, which can inform future optimization of these materials for various applications.

Measurement Techniques for Three-Dimensional Metrology of High Aspect Ratio Internal Features—A Review

Non-destructive measurements of high aspect ratio microscale features, especially those with internal geometries such as micro-holes, remain a challenging metrology problem that is increasing in difficulty due to the increasing requirement for more complexity and higher tolerances in such structures. Additionally, there is a growing use of functional surface texturing for improving characteristics such as heat transfer and wettability. As a result, measurement techniques capable of providing dimensional form and surface finish for these features are of intense interest. This review explores the state-of-the-art inspection methodologies compatible with high-aspect-ratio structures and their suitability for extracting three-dimensional surface data based on identified high-aspect ratio structure types. Here, the abilities, limitations, challenges, and future requirements for the practical implementation and acceptance of these measurement techniques are presented.

Non-integral depth measurement of high-aspect-ratio multi-layer microstructures using numerical-aperture shaped beams

This work presents a new optical metrology technique for accurate depth measurement of individual high-aspect-ratio (HAR) multi-layer microstructures with high spatial resolution and signal-to-noise ratio (SNR). To resolve the limitations of existing optical metrology techniques, light shaping with high light efficiency is optimized using numerical-aperture controlled laser beams. Experimental tests evidenced a 28-fold improvement in SNR for measuring large-depth structures when compared with measurements obtained using traditional broadband incoherent illumination. More importantly, instead of integral measurement characteristics currently limited by conventional spectral reflectometry or scatterometry, non-integral depth measurement of an individual microstructure from densely spaced microstructures such as through-silicon vias (TSV) and redistribution layers (RDL) can be realized using the developed optical measuring system with desired numerical aperture and field of view achieved simultaneously. As demonstrated by the measurement of a single submicron structure with linewidth as small as 0.6 µm and an aspect ratio of 5, the precision of depth measurement can be kept within a few nanometers.

Broadband squeezed microwaves and amplification with a Josephson travelling-wave parametric amplifier

Squeezing of the electromagnetic vacuum is an essential metrological technique used to reduce quantum noise in applications spanning gravitational wave detection, biological microscopy, and quantum information science. In superconducting circuits, the resonator-based Josephson-junction parametric amplifiers conventionally used to generate squeezed microwaves are constrained by a narrow bandwidth and low dynamic range. In this work, we develop a dual-pump, broadband Josephson traveling-wave parametric amplifier that combines a phase-sensitive extinction ratio of 56 dB with single-mode squeezing on par with the best resonator-based squeezers. We also demonstrate two-mode squeezing at microwave frequencies with bandwidth in the gigahertz range that is almost two orders of magnitude wider than that of contemporary resonator-based squeezers. Our amplifier is capable of simultaneously creating entangled microwave photon pairs with large frequency separation, with potential applications including high-fidelity qubit readout, quantum illumination and teleportation.

Monitoring sulfur loss in polycrystalline solid solutions of CaS-La2S3 by Raman spectroscopy and X-ray diffraction

Controlling stoichiometry in materials is a critical consideration in advanced applications. Non-stoichiometry due to sulfur excess or sulfur loss is observed in the CaS-La2S3 (CLS) solid solution, a promising optical and thermoelectric material. We show that Raman spectroscopy can be used to assess deviation from stoichiometry in polycrystalline CLS. Use of this technique shows an increase in the full width at half maximum (FWHM) of the A1 vibrational peak, associated with disorder on the sulfur sublattice. This method is validated using X-ray diffraction, where a decrease in the lattice parameter is observed on either side of the stoichiometric composition. This paper illustrates the usefulness of Raman spectroscopy as a complementary metrology technique to assess stoichiometry in sulfide-based polycrystalline ceramics.

Extending vision ray calibration by determination of focus distances.

The application of cameras as sensors in optical metrology techniques for three-dimensional topography measurement, such as fringe projection profilometry and deflectometry, presumes knowledge regarding the metric relationship between image space and object space. This relation is established by camera calibration and a variety of techniques are available. Vision ray calibration achieves highly precise camera calibration by employing a display as calibration target, enabling the use of active patterns in the form of series of phase-shifted sinusoidal fringes. Besides the required spatial coding of the display surface, this procedure yields additional full-field contrast information. Exploiting the relation between full-field contrast and defocus, we present an extension of vision ray calibration providing the additional information of the focus distances of the calibrated camera. In our experiments we achieve a reproducibility of the focus distances in the order of mm. Using a modified Laplacian based focus determination method, we confirm our focus distance results within a few mm.

Changes in and Recognition of Electrochemical Fingerprints of Acer spp. in Different Seasons

Electroanalytical chemistry is a metrological analysis technique that provides information feedback by measuring the voltammetric signal that changes when a molecule is involved in an electrochemical reaction. There is variability in the type and content of electrochemically active substances among different plants, and the signal differences presented by such differences in electrochemical reactions can be used for plant identification and physiological monitoring. This work used electroanalytical chemistry to monitor the growth of three Acer spp. This work explores the feasibility of the electrochemical analysis technique for the physiological monitoring of highly differentiated plants within the genus and further validates the technique. Changes in the electrochemical fingerprints of A. cinnamomifolium, A. sinopurpurascens and A. palmatum 'Matsumurae' were recorded during the one-year developmental cycle. The results show that the differences in the electrochemical fingerprint profiles of Acer spp. can be used to distinguish different species and identify the growth status in each season. This work also concludes with an identification flowchart based on electrochemical fingerprinting.

The Use of Exchange Coupled Atom Qubits as Atomic-Scale Magnetic Field Sensors.

Phosphorus atoms in silicon offer a rich quantum computing platform where both nuclear and electron spins can be used to store and process quantum information. While individual control of electron and nuclear spins has been demonstrated, the interplay between them during qubit operations has been largely unexplored. This study investigates the use of exchange-based operation between donor bound electron spins to probe the local magnetic fields experienced by the qubits with exquisite precision at the atomic scale. To achieve this, coherent exchange oscillations are performed between two electron spin qubits, where the left and right qubits are hosted by three and two phosphorus donors, respectively. The frequency spectrum of exchange oscillations shows quantized changes in the local magnetic fields at the qubit sites, corresponding to the different hyperfine coupling between the electron and each of the qubit-hosting nuclear spins. This ability to sense the hyperfine fields of individual nuclear spins using the exchange interaction constitutes a unique metrology technique, which reveals the exact crystallographic arrangements of the phosphorus atoms in the silicon crystal for each qubit. The detailed knowledge obtained of the local magnetic environment can then be used to engineer hyperfine fields in multi-donor qubits for high-fidelity two-qubitgates.

Real‐Time Metrology for Roll‐To‐Roll and Advanced Inline Manufacturing: A Review

AbstractRoll‐to‐Roll (R2R) manufacturing is changing how state‐of‐the‐art technology is made. Roll‐to‐Roll is part of a family of advanced scalable inline manufacturing techniques that make traditional and state‐of‐the‐art products at high yield and reduced cost. R2R manufacturing has grown rapidly and is fundamental to several advanced technologies such as functional materials and films, sensors for medicine, biology, and environment monitoring, energy harvesting devices, and flexible electronics. Advantages of R2R manufacturing include ease of machine design, adaptability to a wide range of additive processing methods, and very high throughput. To keep up with advances in R2R manufacturing, novel methods have emerged to measure important product metrics (thickness, roughness, conductivity) and monitor quality (uniformity, defects) inline and in real‐time. This review provides an overview of the state‐of‐the‐art for real‐time inline metrology and quality control in modern R2R manufacturing. The survey considers both established inline metrology techniques such as line‐scan imaging and reflectometry, and techniques recently adapted or that show promise for real‐time inline R2R metrology such as ellipsometry, hyper‐spectral imaging, and Raman spectroscopy.

Size characterization of plasmonic nanoparticles with dark-field single particle spectrophotometry

Plasmonic nanoparticles are widely used in multiple scientific and industrial applications. Although many synthesis methods have been reported in the literature throughout the last decade, controlling the size and shape of large populations still remains as a challenge. As size and shape variations have a strong impact in their plasmonic properties, the need to have metrological techniques to accurately characterize their morphological features is peremptory. We present a new optical method referred as Dark-Field Single Particle Spectrophotometry which is able to measure the individual sizes of thousands of particles with nanometric accuracy in just a couple of minutes. Our method also features an easy sample preparation, a straightforward experimental setup inspired on a customized optical microscope, and a measurement protocol simple enough to be carried out by untrained technicians. As a proof of concept, thousands of spherical nanoparticles of different sizes have been measured, and after a direct comparison with metrological gold standard electron microscopy, a discrepancy of 3% has been attested. Although its feasibility has been demonstrated on spherical nanoparticles, the true strengthness of the method is that it can be generalized also to nanoparticles with arbitrary shapes and geometries, thus representing an advantageous alternative to the gold-standard electron microscopy.

Two-dimensional speckle technique for slope error measurements of weakly focusing reflective X-ray optics.

Speckle-based at-wavelength metrology techniques now play an important role in X-ray wavefront measurements. However, for reflective X-ray optics, the majority of existing speckle-based methods fail to provide reliable 2D information about the optical surface being characterized. Compared with the 1D information typically output from speckled-based methods, a 2D map is more informative for understanding the overall quality of the optic being tested. In this paper, we propose a method for in situ 2D absolute metrology of weakly focusing X-ray mirrors. Importantly, the angular misalignment of the mirror can be easily corrected with the proposed 2D processing procedure. We hope the speckle pattern data processing method presented here will help to extend this technique to wider applications in the synchrotron radiation and X-ray free-electron laser communities.

Dimensional X-Ray computed tomography: Apparent feature form error and its effect on measurement tasks

X-ray computed tomography (XCT) provides a unique set of dimensional measurement capabilities suitable for assessing complex geometry. However, due to the origins of XCT as a medical imaging method and qualitative non-destructive examination technique, only recently has XCT been rigorously investigated as a dimensional metrology tool. Although the data produced via XCT may be leveraged with conventional coordinate metrology techniques, the instrument physics and volumetric reconstruction methods which govern the accuracy and precision of the data are complex, workpiece-specific, and non-negligible. In particular, there is minimal prior work which has studied complex multi-step metrology tasks such as datum reference frame (DRF) construction and feature position measurement. In this work, a qualified artifact was used to evaluate the fitness of XCT for such a task. Multiple XCT systems were used, and multiple instrument magnification levels compared. The form error of planar and cylindrical features was evaluated. Further, the influence of individual feature reconstruction on the development of datums and upstream position measurements was studied. It was found that negative, i.e., bore-like, and positive, i.e., pin-like configurations of certain features were subject to distinct XCT artifact effects which caused upstream measurement errors when these features were used to construct a DRF. High magnification and X-ray scatter produced high spatial frequency noise in surface reconstruction while beam hardening and beam penetration distance variation produced gross apparent form error. The latter was associated with greater measurement errors in feature position measurement within an DRF.

Optical quantum super-resolution imaging and hypothesis testing

Estimating the angular separation between two incoherent thermal sources is a challenging task for direct imaging, especially at lengths within the diffraction limit. Moreover, detecting the presence of multiple sources of different brightness is an even more severe challenge. We experimentally demonstrate two tasks for super-resolution imaging based on hypothesis testing and quantum metrology techniques. We can significantly reduce the error probability for detecting a weak secondary source, even for small separations. We reduce the experimental complexity to a simple interferometer: we show (1) our set-up is optimal for the state discrimination task, and (2) if the two sources are equally bright, then this measurement can super-resolve their angular separation. Using a collection baseline of 5.3 mm, we resolve the angular separation of two sources placed 15 μm apart at a distance of 1.0 m with a 1.7% accuracy - an almost 3-orders-of-magnitude improvement over shot-noise limited direct imaging.

Application of deep-learning based techniques for automatic metrology on scanning and transmission electron microscopy images

Scanning or transmission electron microscopy (SEM/TEM) are standard techniques used during Research and Development (R&D) phases to study the structure and morphology of microscopic materials. Variety in object shapes and sizes are observed in such images to ensure robust micro- and nanomaterials critical dimension analysis. This way, precision and accuracy can be guaranteed during materials manufacturing processes. Such diversity and complexity in the data make it challenging to automatically extract the desired measurements of these microscopic structures. Existing tools in metrology often require many manual interactions, therefore being slow and prone to user errors. Proposed semiautomatic and automatic tools in the state-of-the-art are also limited and not designed to handle large variations across the images. Thus, the application of advanced machine or deep learning techniques could bring great efficiency in SEM/TEM image analysis and measurements for microscopic scale R&D processes. In this paper, we demonstrate the feasibility of deep-learning based object detection and instance segmentation models to perform automatic and accurate metrology on microscopic images with high object variability. We also show that custom object detection models prepared using pretrained weights, finetuned on very limited custom data, can outperform detection models built using traditional methods. This is particularly useful in metrology for the semiconductor industry, where data scarcity is common. When the data are available, we observe that it can be useful to be able to generate a large number of quality annotations to use instance segmentation. This could allow the training of more complex deep learning models for particle recognition and analysis. Therefore, we propose a semiautomatic tool to help produce annotations and demonstrate its application in an instance segmentation task.

General Problem of Metrology and Measurement Technique JCGM GUM-6:2020: Comments on the Russian Translation

General Problem of Metrology and Measurement Technique JCGM GUM-6:2020: Comments on the Russian Translation

Surface metrology by multiple-wavelength coherent modulation imaging.

With the rapid progress of advanced manufacturing, three-dimensional metrology techniques that are able to achieve nanometer spatial resolution and to capture fast dynamics are highly desired, for which a snapshot ability and a common-light-path setup are required. Commonly used off-axis holography and phase-shifting interferometry are short in fulfilling those requirements. We studied the suitability and performance of the coherent modulation imaging (CMI) method for metrology applications. Both transparent and reflective samples are measured in visible light experiments. Thanks to its ability to retrieve separate wavefronts at different wavelengths from a single measurement, CMI allows for attaining an enlarged range of measurement free from phase wrapping by utilizing the concept of synthetic wavelength. The CMI method fulfills well the requirements for advanced metrology and can be implemented at any wavelength. We expect it would be a powerful addition to the pool of advanced metrology tools.