InGaN/GaN based blue LEDs with 2-μm-thick crack-free GaN buffer layers were successfully grown and fabricated on patterned Si (1 1 1) substrates. The patterns on the substrates include 340 μm×340 μm square islands, separated by 3-μm deep and 20 μm wide trenches, along the 〈 1 l ¯ 0 〉 and 〈 1 1 2 ¯ 〉 crystalline orientations. In addition to using the patterned growth technique, thin AlN and SiN x interlayers grown at high temperatures were also employed to partially release the residual stress and to further improve the crystalline quality. Blue LEDs of 300×300 μm 2 fabricated on the islands, without thinning and packaging, exhibited a high output power of around 0.7 mW at a drive current of 20 mA. Compared to III-nitride LEDs grown on sapphire substrates, the same LED structures grown on patterned Si substrates showed a few nm of red shift in emitting wavelength, suggesting some residual stress of GaN on patterned Si.
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