Aluminum doping hexagonal barium ferrite film with large perpendicular magnetic anisotropy (PMA) and high remanence ratio was prepared on Al2O3 substrate by post-annealing at high temperature. The crystal structure measurements have shown that the crystallinity and degree of orientation were improved by post-annealing at high temperature, while it happened the Al ions diffusion from the Al2O3 substrate into the ferrite film at 1100 °C of annealing temperature. The diffusion phenomenon is also confirmed by the distribution of elements in the cross-section which displays a wide and slow-changing region of Al element. The Al element diffusion gives rise to a decrease of saturation magnetization, and an increase of coercivity and remanence ratio. Generally, a hexagonal barium ferrite film with large PMA field (HA = 18.1 kOe), relatively small FMR linewidth (540 Oe) and high remanence ratio (86%) was obtained by annealing the film at 1100 °C, which shows potential applied in self-biased microwave devices.
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