In order to maintain gate controllability of electric current in nanoscale transistors, nanosheet or nanowire channels are required for future nodes. In Si covered by oxides, deformation potential greater than that in bulk has been used to reproduce electron mobility. Increase of the deformation potential results in decrease of phonon-limited mobility. However, physical origin of the increase of phonon scattering in nanostructures was not completely understood. Although atomistic calculations with H-terminated Si nanosheets partially explained the increase of phonon scattering, the amount of the increase of phonon scattering was not sufficient to reproduce experimental mobility or empirical values of deformation potential [1]. In this work, we calculated mobility in oxide covered semiconductor nanowires by Molecular dynamics (MD)-Landauer approach [2]. Based on MD simulations followed by transport calculations of tight-binding nonequilibrium Green’s function model, effects of the oxide layers on phonon scattering in the semiconductor nanowires was considered.The derived phonon-limited mobility of the free-standing Si nanowire (205 cm2V-1s-1) was almost the same as previously reported value in H-terminated Si nanowire [2], confirming the validity of our calculations. In the SiO2-covered Si nanowires, the mobility was decreased by half due to the SiO2 (95 cm2V-1s-1). Corresponding effective deformation potential was extracted by comparing the mobility calculated from MD-Landauer approach with the mobility calculated from Boltzmann transport equation. The corresponding deformation potential in SiO2-covered Si nanowires (D ac=22 eV) roughly agrees with the empirical deformation potentials in SOI films of the same thickness [3]. From the comparison between the free-standing and the SiO2-covered nanowires, we found the atomic displacements in the SiO2-covered Si nanowires were abnormally increased at the surface, which would result in the enhance of phonon scattering. Therefore, in order to precisely model the transport properties in future node’s transistors, atomistic descriptions of the interface between semiconductor and oxide were indispensable.[1] J. Li, JAP, 120, 174301, 2016.[2] T. Markussen, PRB, 95, 245210, 2017.[3] T. Ohashi, IEEE JEDS, 4, 278, 2016. Figure 1
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