Low temperature discharges with their unique non-equilibrium properties are often used in industrial processes for the deposition of ultra-thin (plasma) polymer films. Applications for this type of thin films range from protective coatings to their use in membranes, biosensors and batteries. However, the properties of these thin films are highly dependent on the choice of discharge parameters, both in terms of their surface topography and their chemical composition. This paper deals with the great potential of pulsed discharges for the controlled deposition of plasma polymer films. The influence of pulse frequency and duty cycle on the deposition process and the properties of the resulting thin films is discussed from a theoretical point of view and is illustrated by experimental results. The latter concern examples of experiments carried out with discharges operated with acetylene or aniline, as well as functional coatings on top of MoS2, 2D graphene or CNTs. The work was supported by the project PEGASUS (Plasma Enabled and Graphene Allowed Synthesis of Unique nano-structures), funded by the European Union’s Horizon research innovation program under Grant Agreement No. 766894; EU Graphene Flagship FLAG-ERA III JTC 2021 project VEGA (No. PR-11938) Project-ANR-21-GRF1-0004. Further support was obtained via ARD MATEX Centre-Val de Loire Region (projects Carbon2 and Carbon3) and project Orleans Metropole (both France).
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