Experiments show that large amounts (about 0.1 wt%) of gaseous impurities in TiMo alloy filaments can be removed by heating for more than 10 h in an ultra-high vacuum at over 1000°C, and that gases adsorbed on Ti films exposed to air can be effectively removed by baking at temperatures higher than 310°C. Based on these results, a new procedure to purify both Ti sources and films simultaneously is proposed. This is achieved using a vacuum chamber made of type 304 stainless steel which is degassed by oxidation in the air and conventional baking. This procedure decreases the outgassing from TiMo filaments to the order of 10 −10 Pa. When the turbomolecular pump is separated from the main chamber with a gate valve and the Ti film is cooled with liquid nitrogen, the pressure drops below 1 × 10 −10 Pa. Even after the system is re-exposed to air, the evacuation process can be successfully repeated.
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