Atomic Layer Deposition (ALD) is an advantageous technique to obtain alumina (Al2O3) optical waveguides based on the trimethylaluminum-water (TMA-H2O) process. However, the influence of ozone (O3) as oxygen source on pure Al2O3 ALD waveguides has not been studied yet. In this work, the optical design, fabrication and characterization of slab optical waveguides based on Al2O3 thin films using water (Al2O3–H2O) or ozone (Al2O3–O3) as oxygen source is presented. Ellipsometry measurements show a refractive index of 1.64 for Al2O3–H2O and of 1.65 for Al2O3–O3 waveguides. The intensity distribution at the waveguides output demonstrates propagation of visible light (λ = 632.8 nm) for both type of waveguides. Optical propagation losses are smaller for O3 than for H2O waveguides, the lowest value for Al2O3–O3 is 0.51 dB/cm and 3.03 dB/cm for Al2O3–H2O. Fourier transform infrared spectroscopy (FTIR) analysis shows a prominent band for bulk OH group in water oxidized samples, which may be associated with the increase of propagation losses. X-ray photoelectron spectroscopy (XPS) show no differences in chemical composition (supplementary material).
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