A 200 nm thick AlN layer is fabricated by Hydride Vapor Phase Epitaxial (HVPE) technique onto the n-type Silicon < 111 > wafer. After epitaxial growth the AlN is masked and 100 nm thick interdigitated electrodes of Silver are deposited by the atomistic scaled Physical Vapor Deposition (PVD) system. These interdigitated electrodes are further examined with five possible circuit configurations of AlN/Silicon under multiple biases and temperatures. Different electrical and electro-optical characterization such as Current-Voltage, Charge Deep Level Transient Spectroscopy and Kinetics of Dark and UV current; have been performed for each configuration. For all such cases the Ultra-Violet (UV) light has been sensed and found that the reversed biased silicon coupled with interdigitated AlN schemes may provide largest responsivity under both photovoltaic and photoconductive modes. Also, the photo-conversion gain (ratio of UV Current / Dark Current) of each case under different physical conditions have also been emulated and found that the same reverse biased configuration leads higher extent of photo-conversion gain. The charge based transient analysis using (Q-DLTS) have been performed for all said configurations and it is found that the same reverse biased scheme offers largest magnitude of capture cross section i.e. ~ 10−18 cm2, which may capture larger extent of free charge carriers in UV mode and could be opted for enhanced UV light detection.
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