Based on the technological characteristics of roll-type polishing, a new asymmetric vibration-assisted stage is proposed in this paper. This stage is characterized by asymmetric displacement and asymmetric stiffness. With the average particle spacing of roll-type polishing as the constraint, the comprehensive characteristics of structural stiffness, kinematic range, and natural frequency are realized. Thus, to reduce the surface roughness, the removal of simple-directional surface textures generated by roll-type polishing can be achieved. First, the asymmetric structure is designed, modeled, and optimized according to working performance design goals of roll-type polishing. Then, the finite element analysis and actual performance test of the stage are carried out to verify the accuracy of the established model and the effectiveness of the optimization design. The results indicate that the stage can meet the design index. Finally, the asymmetric vibration-assisted polishing experiment is carried out. The results show that the single-directional surface textures of the SiC surface are interrupted and the surface roughness is decreased.
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