Highly conducting and transparent hybrid organic–inorganic thin films were grown using atomic layer deposition (ALD) and molecular layer deposition (MLD) techniques. The conducting films were grown at 150 °C by combining ZnO ALD and zincone MLD processes. ZnO ALD was performed using diethylzinc (DEZ) and water (H2O). Zincone MLD was performed using DEZ and hydroquinone (HQ). The ALD:MLD alloys were deposited by controlling the relative number of ALD and MLD cycles in the reaction sequence. The growth of the ALD:MLD alloys was examined using in situ quartz crystal microbalance and Fourier transform infrared spectroscopy studies. The surface reactions during alloy growth were self-limiting, and the ALD and MLD reaction sequences produced linear growth rates. The alloys exhibited exceptional conductivity relative to ZnO ALD films grown at 150 °C. The highest conductivities were obtained from alloys with ALD:MLD cycle ratios of 1:1 and 2:2. The 1:1 and 2:2 alloy films yielded conductivities of 116 and 170 S/c...