Effect of Al doping on the structural, optic, and electrochromic properties of tungsten trioxide (WO3) thin films was investigated through X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy, atomic force microscopy, optic transmittance, spectral ellipsometry, cyclic voltammetry and chronoamperometry measurements. Undoped and 0.7–4.3% Al doped WO3 films were grown by radio frequency magnetron sputtering. All of the WO3:Al films investigated grew in amorphous phase. The thicknesses of the films varied between 113 and 124 nm. X-ray photoelectron spectroscopy analysis indicated that tungsten atoms exist as W6+ in both undoped and Al doped WO3 films. The optical transmittance of WO3 films is not affected by the Al doping. Their transparency in the visible range is around 90% while the transmittance in the near infrared region seems to slightly increase (around 5%) with increasing Al doping. The optical band gap energies increase with Al doping concentrations exceeding 1.5%. Variation of the coloration / bleaching times and coloration efficiency of the WO3 films with Al doping was analyzed. The highest optical modulation of 44% was obtained for 1.5% Al doped WO3 film at 630 nm.
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