Abstract
We carried out XPS and AES studies in order to observe the effect of Ar-plasma treatment of a photopolymer-glass substrate, on which a TbFeCo magneto-optical recording layer was deposited by RF sputtering. Sputter-etching of the polymer surface prior to deposition of TbFeCo, resulted in significant reduction in the amount of terbium oxide formed at the interface between the metal alloy layer and the polymer layer when the film was fabricated on an intact polymer surface. Stability of the recording film was improved largely through this etching process. This is considered to be due to the removal of oxygen-containing functional groups, thus hindering the oxidation of terbium in the adjacent recording layer.
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